LA-ICPMS analysis ESLfemto UC
Reduce thermal effects with Elemental Scientific's ultrafast technology and deliver the highest quality analytical data.

LA-ICPMS analysis


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laser ablation equipment, better stoichiometric analysis, precise analytical data, LA-ICPMS forensic

Dramatically reduce thermal effects to achieve better stoichiometric analysis for the most precise analytical data.

Finally, a no-compromise, turnkey, robust and stable femtosecond laser ablation instrument.

Discover higher sensitivity, improved stability, and less fractionation with ultrafast laser ablation.

  • Environmental
  • Geological
  • Forensic
  • Medical
  • Mining
  • Electronic
  • Manufacturing (metals/glass/plastics)
  • Geochemistry
  • Geochronology
  • Elemental/Isotope ratios
  • Purity testing
  • Material characterization
  • Bulk Analysis
  • Failure Analysis
  • (Bio-) Imaging/Mapping
  • Sulfate/Sulfite analysis
  • Depth Profiling
  • Rocks/Minerals
  • Analysis of geological materials, including volcanic glasses, silicate minerals, calcite, and sulfate/sulfite
  • Micro-feature analysis on fluid inclusions in quartz and halite
  • Glass/Ceramics
  • Metals/alloys
  • Biological/plant materials
  • Plastics, powders, thin films
  • Bulk analysis on metals, alloys, polymers and ceramics
  • Direct micro-analysis on mineral grains
  • Elemental imaging

Robust turnkey femtosecond LA.

  • Only 1 transmissive optic to minimize pulse stretching
  • Laser: Pharos HE from Light Conversions
  • Max Repetition Rate: 10,000 Hz
  • Fluence: UV: energy densities of up to 10 J/cm2 (1028nm), 5 J/cm2 (257nm) and 3 J/cm2 (206nm) are achievable, with a stability <0.1% RSD even over long analytical sessions
  • Spot Sizes: 1–65 microns, Infinitely Variable Aperture (IVA) as standard, provides spot size selection in 1 micron increments

Robust package, true mobility and application flexibility.

  • Thermally and mechanically stable, high energy Pharos HE fs laser source from Light Conversion
  • New, Rugged Universal Compact Cart (RUCC) with kinematic laser mounting
  • Smallest footprint and greatest mobility
  • UV and Deep UV options
  • Optional second MFC for N2 flow control
  • Dual wavelength configurations are available with software controlled wavelength selection
  • Compatible with ESL’s TwoVol3 ablation chamber for the ultimate in high speed imaging and high precision performance
  • New flat-top energy profile at 257nm available