LA-ICPMS analysis

The UHV chamber from ESL fits seamlessly into the NWR platform in a laser-safe Class 1 environment through an innovative design by University College London.

Flush geometry

• Designed with recessed bolts and a flush sapphire window to maximise available volume and eliminate contact between the chamber and the objective lens

Large working area

• 52 mm sapphire window gives huge working area. Volume can be reduced using spacers inside the chamber

Ultra-High Vacuum

• Tested to <10^-10 atm-cc/sec

Flexible Applications

• The UHV chamber can be switched to a standard TwoVol2 sample chamber (for ICPMS) in under 10 minutes by the user using the same high-precision stage unit.
• Suitable for 213 nm, 193 nm and femtosecond laser ablation systems.

Unsurpassed stage return accuracy

• High precision cross-roller stages with direct, non-cantilevered stage mounting for consistent loading at all stage positions – less wear and tear on stages
• Return exactly to the location of original pattern placement – analyze where you intend to
• < 1.5 µm short term stage return accuracy
• < 4 µm long term stage return accuracy
• < 1 µm long term stage return accuracy with ImageLock